Michael Raab
Advanced Micro Devices
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Publication
Featured researches published by Michael Raab.
Materials Science Forum | 2008
Martin Trentzsch; Christian Golz; Karsten Wieczorek; Rolf Stephan; Tilo Mantei; Boris Bayha; Susanne Ohsiek; Michael Raab; Zsolt Nenyei; Wilfried Lerch; Jürgen Niess; Waltraud Dietl; Christoph Kirchner; Georg Roters
In this work we present a comprehensive comparison of ultra thin thermally nitrided (TN) to plasma nitrided (PN) gate dielectrics (GD). We will show that thermal nitridation is a promising technique to increase the nitrogen concentration up to 25%. Furthermore, we will demonstrate that ultra thin thermally nitrided GD have the potential to be an alternative solution compared to plasma nitrided GD. This work includes the analysis of physical and electrical parameters as well as reliability results from reliability characterization. Additionally, we investigated the impact of Deuterium on electrical parameters and reliability behavior.
Archive | 2006
Jan Hoentschel; Andy Wei; Thorsten Kammler; Michael Raab
Archive | 2000
Karsten Wieczorek; Michael Raab; Rolf Stephan
Archive | 2000
Karsten Wieczorek; Michael Raab; Rolf Stephan
Archive | 2000
Karsten Wieczorek; Michael Raab; Rolf Stephan
Archive | 1999
Karsten Wieczorek; Michael Raab; Gert Burbach
Archive | 2003
Karsten Wieczorek; Stephan Kruegel; Michael Raab
Archive | 2000
Karsten Wieczorek; Michael Raab; Rolf Stephan
Archive | 2005
Markus Lenski; Wolfgang Buchholtz; Andy Wei; Michael Raab
Archive | 2001
Karsten Wieczorek; Manfred Horstmann; Rolf Stephan; Michael Raab
