Woo-Yeong Cho

A 90nm 1.8V 512Mb Diode-Switch PRAM with 266MB/s Read Throughput

A 512Mb diode-switch PRAM is developed in a 90nm CMOS technology. A core configuration, read/write circuit techniques, and a charge-pump system for the diode-switch PRAM are described. Through these schemes, the PRAM achieves read throughput of 266MB/S and maximum write throughput of 4.64MB/S with a 1.8V supply.

A 58nm 1.8V 1Gb PRAM with 6.4MB/s program BW

In mobile systems, the demand for the energy saving continues to require a low power memory sub-system. During the last decade, the floating-gate flash memory has been an indispensable low power memory solution. However, NOR flash memory has begun to show difficulties in scaling due to the devices reliability and yield issues. Over the past few years, phase-change random access memory (PRAM) has emerged as an alternative non-volatile memory (NVM) owing to its promising scalability and low cost process [1,2]. In this paper, a PRAM, implemented in a 58nm PRAM process with a low power double-data-rate nonvolatile memory (LPDDR2-N) interface, is presented [3].

A 0.1/spl mu/m 1.8V 256Mb 66MHz Synchronous Burst PRAM

A 256Mb PRAM featuring synchronous burst read operation is developed. Using a charge-pump system, write performance is characterized at 1.8V supply. Measured initial read access time and burst-read access time are 62ns and 10ns, respectively. The maximum write throughput is 3.3MB/S

Processor-Based Built-in Self-Optimizer for 90nm Diode-Switch PRAM

A PRAM includes 8 b embedded RISC to generate the optimized internal timing and voltage parameters to control the variations of the cell resistances. The PRAM blocks with small margin window of cell resistances are detected, analyzed and controlled by processor-based built-in self-optimizer (BISO). A 4 Mb test PRAM is fabricated in a 90 nm 3-metal diode-switch PRAM cell technology. Measured margin increases by up to 221%.