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Heike Berthold

Advanced Micro Devices

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Publication

Featured researches published by Heike Berthold.

Archive | 2011

Threshold adjustment for MOS devices by adapting a spacer width prior to implantation

Uwe Griebenow; Jan Hoentschel; Kai Frohberg; Heike Berthold; Katrin Reiche; Frank Feustel; Kerstin Ruttloff

Archive | 2008

Double deposition of a stress-inducing layer in an interlayer dielectric with intermediate stress relaxation in a semiconductor device

Kai Frohberg; Uwe Griebenow; Katrin Reiche; Heike Berthold

Archive | 2013

HIGH-K GATE ELECTRODE STRUCTURE FORMED AFTER TRANSISTOR FABRICATION BY USING A SPACER

Kai Frohberg; Uwe Griebenow; Katrin Reiche; Heike Berthold

Archive | 2009

METHOD FOR SELECTIVELY REMOVING A SPACER IN A DUAL STRESS LINER APPROACH

Kai Frohberg; Volker Grimm; Heike Salz; Heike Berthold

Archive | 2009

Verfahren zur Einstellung der Höhe einer Gateelektrode in einem Halbleiterbauelement

Kai Frohberg; Heike Berthold; Katrin Reiche; Uwe Griebenow

Archive | 2010

Schwellwerteinstellung für MOS-Elemente durch Anpassen einer Abstandshalterbreite vor der Implantation

Uwe Griebenow; Jan Hoentschel; Kai Frohberg; Heike Berthold; Katrin Reiche; Frank Feustel; Kerstin Ruttloff

Archive | 2010

Tension reduction during the introduction of a chip into a housing by means of a trained around the chip voltage compensation region

Heike Berthold; Dmytro Chumakov; Michael Grillberger; Katrin Reiche

Archive | 2010

Verspannungsverringerung beim Einbringen eines Chips in ein Gehäuse mittels eines um den Chip herum ausgebildeten Spannungskompensationsgebiets Tension reduction during the introduction of a chip into a housing by means of a trained around the chip voltage compensation area

Heike Berthold; Dmytro Chumakov; Michael Grillberger; Katrin Reiche

Archive | 2010

Gateelektrodenstruktur mit großem epsilon, die nach der Transistorherstellung unter Anwendung eines Abstandshalters gebildet wird

Kai Frohberg; Uwe Griebenow; Katrin Reiche; Heike Berthold

Archive | 2009

Verfahren zum selektiven Entfernen eines Abstandshalters in einem dualen Verspannungsschichtverfahren

Kai Frohberg; Volker Grimm; Heike Salz; Heike Berthold

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Collaboration

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Kai Frohberg

Advanced Micro Devices

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Katrin Reiche

Advanced Micro Devices

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Uwe Griebenow

Advanced Micro Devices

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Frank Feustel

Advanced Micro Devices

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Heike Salz

Advanced Micro Devices

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Kerstin Ruttloff

Advanced Micro Devices

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Volker Grimm

Advanced Micro Devices

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Jan Hoentschel

GlobalFoundries

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Dmytro Chumakov

GlobalFoundries

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Michael Grillberger

GlobalFoundries

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