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Featured researches published by Jeng-Shien Hsieh.


international electron devices meeting | 2013

Array antenna integrated fan-out wafer level packaging (InFO-WLP) for millimeter wave system applications

Chung-Hao Tsai; Jeng-Shien Hsieh; Monsen Liu; En-Hsiang Yeh; Hsu-Hsien Chen; Ching-Wen Hsiao; Chen-Shien Chen; Chung-Shi Liu; Mirng-Ji Lii; Chuei-Tang Wang; Doug C. H. Yu

Array antenna integrated with RF chip using InFO-WLP technology is proposed for millimeter wave system applications. Aperture-coupled patch antenna is designed on the fan-out molding compound (MC). The performance of single-element antenna is evaluated first and proved to have 5 dBi of gain. Meanwhile, the interconnect from chip to antenna feeding line is demonstrated to only have 0.7 dB loss, which can save 19 % PA output power compared with that of flip-chip package. Finally, the system performance of 4 × 4 antenna array integrated with RF chip on the InFO structure shows 14.7 dBi of array gain in a small form factor of 10 × 10 × 0.5 mm3.


international electron devices meeting | 2015

High performance passive devices for millimeter wave system integration on integrated fan-out (InFO) wafer level packaging technology

Chung-Hao Tsai; Jeng-Shien Hsieh; Wei-Heng Lin; Liang-Ju Yen; Jeng-Nan Hung; Tai-Hao Peng; Hsi-Ching Wang; Cheng-Yu Kuo; Issac Huang; Welling Chu; Yi-Yang Lei; Chung-Yi Yu; Lawrence Chiang Sheu; C.H. Hsieh; C. S. Liu; Kuo-Chung Yee; Chuei-Tang Wang; Doug C. H. Yu

High performance passive devices for millimeter wave (MMW) system, including inductor, ring resonator, power combiner, coupler, balun, transmission line, and antenna, are first realized using integrated fan-out (InFO) wafer level packaging technology. The inductors has quality factor over 40; the power combiner, coupler, and balun show lower transmission loss than on-chip passives; antenna has the efficiency of over 60%. These devices on InFO enable low noise and power MMW system for mobile communication and IoT applications.


ieee international d systems integration conference | 2015

Power saving and noise reduction of 28nm CMOS RF system integration using integrated fan-out wafer level packaging (InFO-WLP) technology

Chuei-Tang Wang; Jeng-Shien Hsieh; Victor C. Y. Chang; En-Hsiang Yeh; Feng-Wei Kuo; Hsu-Hsien Chen; Chih-Hua Chen; Ron Chen; Ying-Ta Lu; Chewn-Pu Jou; Hao-Yi Tsai; C. S. Liu; Doug C. H. Yu

An integration of 28 nm CMOS RF system with 3D solenoidal inductors (3DSI) in integrated fan-out (InFO) wafer level package technology is studied. The 3DSI provides the performance of Q-factor of 51 and isolation of -53 dB. With the 3DSI, the RF system in the InFO technology results in power saving by 58% and noise reduction by 80% in LNA and VCO, respectively, compared with those in RF SoC system. The InFO technology provides a novel solution for RF system integration.


electronic components and technology conference | 2017

High Performance Chip-Partitioned Millimeter Wave Passive Devices on Smooth and Fine Pitch InFO RDL

Che-Wei Hsu; Chung-Hao Tsai; Jeng-Shien Hsieh; Kuo-Chung Yee; Chuei-Tang Wang; Douglas Yu

High performance millimeter wave passive devices are realized on smooth, fine pitch InFO redistribution layer (RDL). These passive devices are balun, power combiner, coupler, and microstrip line and the electrical performances are measured from 0.1GHz to 67 GHz through VNA. The measurement results show that the transmission loss of on-InFO balun (4.3 dB), the power divider (4.3 dB), and the coupler (4.9 dB) outperforms on-chip one by 2.1 dB, 1 dB, and 0.2 dB, respectively. While the transmission loss of microstrip line (0.34 dB/mm) is better than on-chip one by 0.17 dB/mm at 60 GHz. Furthermore, the parasitic of InFO chip-package interconnection has been investigated and compared to other technologies with and without solder bumps. The parasitic resistance, inductance, and capacitance for InFO interconnection are 75 %, 76 %, and 14 % lower than those for chip-last, face-down technology. Parasitic resistance for InFO RDL is 10 % lower than that for chip-first face-down technology with uneven RDL.


international electron devices meeting | 2016

Ultra-low-resistance 3D InFO inductors for integrated voltage regulator applications

Chen-Shien Chen; Yung-Lung Hsu; Jeng-Shien Hsieh; Ching-Wei Tsai; Victor C. Y. Chang; A. Roth; E. Soenen; C.-T. Wang; Douglas Yu

A novel 3D InFO inductor is developed to integrate with TSMC 16nm FinFET devices for high efficiency integrated voltage regulator (IVR) design. The 3D InFO inductor is designed using thick through-InFO-via (TIV) copper, where the form factor is 1.4 × 2.2 × 0.15 mm3. It performs 2.14 nH inductance at 140 MHz and 3.2 mΩ resistance at DC. The resistance of power delivery network (PDN) between inductor and load is 1.1 mu. The InFO technology provides the low resistance 3D inductor and PDN concurrently for the IVR system design to achieve a peak power efficiency of 93%.


Archive | 2013

RF CHOKE DEVICE FOR INTEGRATED CIRCUITS

Jeng-Shien Hsieh; Monsen Liu; Chung-Hao Tsai; Lai Wei Chih; Yeh En-Hsiang; Chuei-Tang Wang; Chen-Hua Yu


Archive | 2016

Embedding Low-K Materials in Antennas

Monsen Liu; Lai Wei Chih; Chung-Hao Tsai; Jeng-Shien Hsieh; En-Hsiang Yeh; Chuei-Tang Wang


Archive | 2016

Inductor For Semiconductor Integrated Circuit

Hao-Hsiang Chuang; Jeng-Shien Hsieh; Chuei-Tang Wang; Chen-Hua Yu


electronic components and technology conference | 2018

High Performance, High Density RDL for Advanced Packaging

Chung-Yi Yu; Liang-Ju Yen; Cheng-chieh Hsieh; Jeng-Shien Hsieh; Victor C. Y. Chang; C.H. Hsieh; C. S. Liu; Chang Wang; Kuo-Chung Yee; Doug C. H. Yu


electronic components and technology conference | 2018

InFO_AiP Technology for High Performance and Compact 5G Millimeter Wave System Integration

Chuei-Tang Wang; Tzu-Chun Tang; Chun-Wen Lin; Che-Wei Hsu; Jeng-Shien Hsieh; Chung-Hao Tsai; Kai-Chiang Wu; H.P. Pu; Douglas Yu

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