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Dive into the research topics where John H. Lau is active.

Publication


Featured researches published by John H. Lau.


Journal of Virology | 2012

Discovery of seven novel Mammalian and avian coronaviruses in the genus deltacoronavirus supports bat coronaviruses as the gene source of alphacoronavirus and betacoronavirus and avian coronaviruses as the gene source of gammacoronavirus and deltacoronavirus.

Patrick C. Y. Woo; Susanna K. P. Lau; Carol S. F. Lam; Candy C. Y. Lau; Alan K. L. Tsang; John H. Lau; Ru Bai; Jade L. L. Teng; Chris C. C. Tsang; Ming Wang; Bo-Jian Zheng; Kwok-Hung Chan; Kwok-Yung Yuen

ABSTRACT Recently, we reported the discovery of three novel coronaviruses, bulbul coronavirus HKU11, thrush coronavirus HKU12, and munia coronavirus HKU13, which were identified as representatives of a novel genus, Deltacoronavirus, in the subfamily Coronavirinae. In this territory-wide molecular epidemiology study involving 3,137 mammals and 3,298 birds, we discovered seven additional novel deltacoronaviruses in pigs and birds, which we named porcine coronavirus HKU15, white-eye coronavirus HKU16, sparrow coronavirus HKU17, magpie robin coronavirus HKU18, night heron coronavirus HKU19, wigeon coronavirus HKU20, and common moorhen coronavirus HKU21. Complete genome sequencing and comparative genome analysis showed that the avian and mammalian deltacoronaviruses have similar genome characteristics and structures. They all have relatively small genomes (25.421 to 26.674 kb), the smallest among all coronaviruses. They all have a single papain-like protease domain in the nsp3 gene; an accessory gene, NS6 open reading frame (ORF), located between the M and N genes; and a variable number of accessory genes (up to four) downstream of the N gene. Moreover, they all have the same putative transcription regulatory sequence of ACACCA. Molecular clock analysis showed that the most recent common ancestor of all coronaviruses was estimated at approximately 8100 BC, and those of Alphacoronavirus, Betacoronavirus, Gammacoronavirus, and Deltacoronavirus were at approximately 2400 BC, 3300 BC, 2800 BC, and 3000 BC, respectively. From our studies, it appears that bats and birds, the warm blooded flying vertebrates, are ideal hosts for the coronavirus gene source, bats for Alphacoronavirus and Betacoronavirus and birds for Gammacoronavirus and Deltacoronavirus, to fuel coronavirus evolution and dissemination.


Microelectronics International | 2011

Overview and outlook of through-silicon via (TSV) and 3D integrations

John H. Lau

Purpose – The purpose of this paper is to focus on through‐silicon via (TSV), with a new concept that every chip or interposer could have two surfaces with circuits. Emphasis is placed on the 3D IC integration, especially the interposer (both active and passive) technologies and their roadmaps. The origin of 3D integration is also briefly presented.Design/methodology/approach – This design addresses the electronic packaging of 3D IC integration with a passive TSV interposer for high‐power, high‐performance, high pin‐count, ultra fine‐pitch, small real‐estate, and low‐cost applications. To achieve this, the design uses chip‐to‐chip interconnections through a passive TSV interposer in a 3D IC integration system‐in‐package (SiP) format with excellent thermal management.Findings – A generic, low‐cost and thermal‐enhanced 3D IC integration SiP with a passive interposer has been proposed for high‐performance applications. Also, the origin of 3D integration and the overview and outlook of 3D Si integration and 3...


electronic components and technology conference | 2010

TSV manufacturing yield and hidden costs for 3D IC integration

John H. Lau

3D integration consists of 3D IC packaging, 3D IC integration, and 3D Si integration. They are different and in general, the TSV (through-silicon-via) separates the 3D IC packaging and 3D IC/Si integrations, i.e., the latter two use TSV, but 3D IC packaging does not. TSV for 3D integration is >26 years old technology, which (with a new concept that every chip could have two active surfaces) is the focus of this study. Emphasis is placed on the TSV manufacturing yield and hidden costs. A 3D integration roadmap is also provided.


electronic components and technology conference | 2009

Thermal management of 3D IC integration with TSV (through silicon via)

John H. Lau; Tang Gong Yue

Thermal performances of 3D stacked TSV (through silicon via) chips filled with copper are investigated based on heat-transfer CFD (computational fluid dynamic) analyses. Emphases are placed on the determination of (1) empirical equations for the equivalent thermal conductive of chips with various copper-filled TSV diameters, pitches, and aspect ratios, (2) the junction temperature and thermal resistance of 3D stacking of up to 8 TSV chips, and (3) the effect of thickness of the TSV chip on its hot spot temperature. Useful design charts and guidelines are provided for engineering practice convenient.


electronic components and technology conference | 2009

Development of through silicon via (TSV) interposer technology for large die (21×21mm) fine-pitch Cu/low-k FCBGA package

Xiaowu Zhang; T. C. Chai; John H. Lau; Cheryl S. Selvanayagam; Kalyan Biswas; Shiguo Liu; D. Pinjala; Gongyue Tang; Yue Ying Ong; Srinivasa Rao Vempati; Eva Wai; Hong Yu Li; Ebin Liao; Nagarajan Ranganathan; V. Kripesh; Jiangyan Sun; John Doricko; C. J. Vath

Because of Moores (scaling/integration) law, the Cu/low-k silicon chip is getting bigger, the pin-out is getting higher, and the pitch is getting finer. Thus, the conventional organic buildup substrates cannot support these kinds of silicon chips anymore. To address these needs, Si interposer with TSV has emerged as a good solution to provide high wiring density interconnection, to minimize CTE mismatch to the Cu/low-k chip that is vulnerable to thermal-mechanical stress, and to improve electrical performance due to shorter interconnection from the chip to the substrate. This paper presents the development of TSV interposer technology for a 21×21 mm Cu/low-k test chip on FCBGA package. The Cu/low-k chip is a 65 nm, 9-metal layer chip with 150 µm SnAg bump pitch of total 11,000 I/O, with via chain and daisy chain for interconnect integrity monitoring and reliability testing. The TSV interposer size is 25×25×0.3 mm with CuNiAu as UBM on the top side, and SnAgCu bumps on the underside. The conventional BT substrate size is 45×45 mm with BGA pad pitch of 1 mm and core thickness of 0.8 mm. Mechanical and thermal modeling and simulation for the FCBGA package with TSV interposer have been performed. TSV interposer fabrication processes and assembly process of the large die mounted on TSV interposer with Pb-free micro solder bumps and underfill have been set up. The FCBGA samples have been subjected to moisture sensitivity test and thermal cycling (TC) reliability assessments.


international symposium on advanced packaging materials | 2011

Evolution, challenge, and outlook of TSV, 3D IC integration and 3d silicon integration

John H. Lau

3D integration consists of 3D IC packaging, 3D IC integration, and 3D Si integration. They are different and in general the TSV (through-silicon via) separates 3D IC packaging from 3D IC/Si integrations since the latter two use TSV but 3D IC packaging does not. TSV (with a new concept that every chip or interposer could have two surfaces with circuits) is the heart of 3D IC/Si integrations and is the focus of this investigation. The origin of 3D integration is presented. Also, the evolution, challenges, and outlook of 3D IC/Si integrations are discussed as well as their road maps are presented. Finally, a few generic, low-cost, and thermal-enhanced 3D IC integration system-in-packages (SiPs) with various passive TSV interposers are proposed.


electronic components and technology conference | 2009

Study of 15µm pitch solder microbumps for 3D IC integration

Aibin Yu; John H. Lau; Soon Wee Ho; Aditya Kumar; Wai Yin Hnin; Daquan Yu; Ming Ching Jong; V. Kripesh; D. Pinjala; Dim-Lee Kwong

Developments of ultra fine pitch and high density solder microbumps and assembly process for low cost 3D stacking technologies are discussed in this paper. The solder microbumps developed in this work consist of Cu and Sn, which are electroplated in sequential with total thickness of 10µm; The under bump metallurgy (UBM) pads used here is electroless plated nickel and immersion gold (ENIG) with thickness of 2µm. Accordingly, joining of the two Si chips can be conducted by joining CuSn solder microbumps to ENIG UBM pads or CuSn solder microbumps to CuSn solder microbumps. The first joining can only be done with chip to chip assembly whereas the second joining has the potential for chip to wafer assembly. Assembly of the Si chips is conducted with the FC150 flip chip bonder at different temperatures, times, and pressures and the optimized bonding conditions are obtained. After assembly, underfill process is carried out to fill the gap and a void free underfilling is achieved using an underfill material with fine filler size.


electronics packaging technology conference | 2010

Evolution and outlook of TSV and 3D IC/Si integration

John H. Lau

3D integration consists of 3D IC packaging, 3D IC integration, and 3D Si integration. They are different and in general the TSV (through-silicon via) separates 3D IC packaging from 3D IC integration and 3D Si integration since the latter two use TSV but 3D IC packaging does not. TSV (with a new concept that every chip or interposer could have two surfaces with circuits) is the heart of 3D Si integration and 3D IC integration and is the focus of this investigation. The origin of 3D Si integration and 3D IC integration is presented. Furthermore, the evolution and outlook of 3D Si integration and 3D IC integration are discussed as well as their road maps are presented. Finally, a generic, low-cost and thermal-enhanced 3D IC integration system-in-package (SiP) is proposed for high performance applications.


Microelectronics Reliability | 2012

Effects of TSVs (through-silicon vias) on thermal performances of 3D IC integration system-in-package (SiP)

John H. Lau; Tang Gong Yue

Abstract Thermal performances of 3D IC integration system-in-package (SiP) with TSV (through silicon via) interposer/chip are investigated based on heat-transfer and CFD (computational fluid dynamic) analyses. Emphases are placed on the determination of (1) the equivalent thermal conductivity of interposers/chips with various copper-filled, aluminum-filled, and polymer w/o filler filled TSV diameters, pitches, and aspect ratios, (2) the junction temperature and thermal resistance of 3D IC SiP with various TSV interposers, (3) the junction temperature and thermal resistance of 3D stacking of up to 8 TSV memory chips, and (4) the effect of thickness of the TSV chip on its hot spot temperature. Useful design charts and guidelines are provided for engineering practice convenient.


Microelectronics International | 2010

3D LED and IC wafer level packaging

John H. Lau; Ricky Shi Wei Lee; Matthew Ming Fai Yuen; Philip C. H. Chan

Purpose – The purpose of this paper is to propose new 3D light emitting diodes (LED) and integrated circuits (IC) integration packages.Design/methodology/approach – These packages consist of the multi‐LEDs and active IC chip such as the application specific IC, LED driver, processor, memory, radio frequency, sensor, or power controller in a 3D manner. The assembly processes of these packages are also presented and discussed.Findings – The advantages of these 3D integration packages are found to be: better performance, lower cost, less footprint, lighter package, and smaller form factor.Originality/value – A thermal management system for 3D IC and LEDs integration packages is proposed.

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Ming-Ji Dai

Industrial Technology Research Institute

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Heng-Chieh Chien

Industrial Technology Research Institute

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Ra-Min Tain

Industrial Technology Research Institute

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Chau-Jie Zhan

Industrial Technology Research Institute

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M. J. Kao

Industrial Technology Research Institute

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Pei-Jer Tzeng

Industrial Technology Research Institute

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Yu-Lin Chao

Industrial Technology Research Institute

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Wei-Chung Lo

Industrial Technology Research Institute

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Robert Lo

Industrial Technology Research Institute

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Sheng-Tsai Wu

Industrial Technology Research Institute

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