Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Kelvin Doong is active.

Publication


Featured researches published by Kelvin Doong.


international conference on microelectronic test structures | 2014

Direct probing characterization vehicle test chip for wafer level exploration of transistor pattern on product chips

Christopher Hess; Larg Weiland; Amit Joag; Balasubramania Murugan; Sa Zhao; Kelvin Doong; Scott Lin; Hans Eisenmann

Due to recent changes in the manufacturing of FEOL (front end of line) layers it is increasingly difficult to provide rapid learning cycles required to drive yield improvement during new product introduction (NPI). The Direct Probe Characterization Vehicle (DPCV) Test Chip presented here provides direct access to thousands of transistors on a product chip. Only two masks are needed (contact & metal 1) to provide access to the DUTs of the unchanged FEOL layers of a product chip. The DPCV test chip is capable of matching the distribution of product transistor pattern. Measurement data indicate that corrective actions to the design and/or process recipes will reduce the gap between measured product chip transistors and their expected behavior based on SPICE simulations.


ieee electron devices technology and manufacturing conference | 2017

New visions for IC yield detractor detection

Bill Nehrer; Kelvin Doong; Dennis Ciplickas

The observability of conventional electrical test site and imaging techniques needs to be extended and coupled with all of the actual product layout attributes in order to reflect the relevant yield detractors of the current technologies in production and development. This paper discusses new electrical test site strategies that have been recently developed and deployed developed for parametric yield detection and systematic hard defect detection by layout attribute. Such test structures are derived from the actual product and in some key cases also embedded in the product utilizing available space between the active circuitry and detected in-line with non-contact techniques.


Archive | 2015

Opportunistic placement of ic test structures and/or e-beam target pads in areas otherwise used for filler cells, tap cells, decap cells, scribe lines, and/or dummy fill, as well as product ic chips containing same

Indranil De; Dennis Ciplickas; Stephen Lam; Jonathan Haigh; Vyacheslav Rovner; Christopher Hess; Tomasz Brozek; Andrezej J. Stroljwas; Kelvin Doong; John Kibarian; Sherry F. Lee; Kimon Michaels; Marcin Strojwas; Conor O'sullivan; Mehul Jain


Archive | 2016

Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and AA-short-configured, NCEM-enabled fill cells

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2018

Integrated circuit including NCEM-enabled, via-open/resistance-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gate

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2018

Process for making an integrated circuit that includes NCEM-enabled, interlayer overlap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2018

Integrated circuit including NCEM-enabled, interlayer overlap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2017

Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including chamfer short configured fill cells, and the second DOE including corner short configured fill cells

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2017

Process for making semiconductor dies, chips, and wafers using non-contact measurements obtained from DOEs of NCEM-enabled fill cells on wafers that include multiple steps for enabling NC detecteion of AACNT-TS via opens

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama


Archive | 2017

Integrated circuit containing DOEs of GATE-snake-open-configured, NCEM-enabled fill cells

Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama

Collaboration


Dive into the Kelvin Doong's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge