Kimon Michaels
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international symposium on semiconductor manufacturing | 1996
David A. Hanson; Ronald J. G. Goossens; Mark Redford; Jim McGinty; John Kibarian; Kimon Michaels
We have developed a methodology which combines technology CAD (TCAD) simulation with statistical analysis of empirical data to predict and control the manufacturability of IC fabrication processes. As a result, manufacturing tolerance or sigma-based models (also known as worst-case models) can be determined before a significant sample size of fabricated devices can be characterized. Early on in the development cycle, empirical data is collected, and models built from simulated data are refined. These revised models are used to determine process control limits, and optimize in-line and electrical test measurement (E-test) for maximum observability of variation. As the process is stabilized, further refined models are used to perform yield diagnosis and tolerance analysis of circuits. This methodology has been applied to a number of BJT and submicrometer CMOS processes to create predictive sigma-based models, modify the fabrication recipe to meet objective specifications as development proceeds, and finally use them to control the manufacturing line.
international electron devices meeting | 2009
Kimon Michaels
The economic and technological challenges of process development are threatening the timely availability of advanced nodes. Meanwhile design and product organizations are demanding the continued delivery of Moores law density scaling to justify node migration. Balancing the requirements of design with the capabilities and physical limitations of advanced processes will require capitalizing on opportunities for co-optimization between process development, layout and circuit design. In this presentation, we will examine the challenges and highlight the opportunities for achieving an economically feasible path to 22nm.
design automation conference | 2009
Mark Redford; Joseph Sawicki; Prasad Subramaniam; Cliff Hou; Yervant Zorian; Kimon Michaels
The external specifications of an IC (functions, clock rate, power consumption, etc.) determine the competitiveness of a product. To be successful and profitable in the IC business, designers need to “out-design” their competitors. Usually, Design-For-Manufacturing (DFM) is discussed as a yield improvement strategy, but what is the value of DFM from a competitive point of view? Can DFM gives designers a competitive lever by helping them decide how far to push a design without creating a manufacturing disaster? Can DFM be used to optimize designs rather than just identify hot spots?
Archive | 2006
Brian E. Stine; Christopher Hess; John Kibarian; Kimon Michaels; Joseph C. Davis; Purnendu K. Mozumder; Sherry F. Lee; Larg Weiland; Dennis Ciplickas; David M. Stashower
Archive | 2015
Indranil De; Dennis Ciplickas; Stephen Lam; Jonathan Haigh; Vyacheslav Rovner; Christopher Hess; Tomasz Brozek; Andrezej J. Stroljwas; Kelvin Doong; John Kibarian; Sherry F. Lee; Kimon Michaels; Marcin Strojwas; Conor O'sullivan; Mehul Jain
Archive | 2016
Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama
Archive | 2018
Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama
Archive | 2018
Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama
Archive | 2018
Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama
Archive | 2017
Stephen Lam; Dennis Ciplickas; Tomasz Brozek; Jeremy Cheng; Simone Comensoli; Indranil De; Kelvin Doong; Hans Eisenmann; Timothy Fiscus; Jonathan Haigh; Christopher Hess; John Kibarian; Sherry Lee; Marci Liao; Sheng-che Lin; Hideki Matsuhashi; Kimon Michaels; Conor O'sullivan; Markus Rauscher; Vyacheslav Rovner; Andrzej J. Strojwas; Marcin Strojwas; Carl Taylor; Rakesh Vallishayee; Larg Weiland; Nobuharu Yokoyama