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Dive into the research topics where Michael J. Hargrove is active.

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Featured researches published by Michael J. Hargrove.


Journal of Electrostatics | 1993

Shallow trench isolation double-diobe electrostatic discharge circuit and interaction with DRAM output circuitry

Steven H. Voldman; Vaughn P. Gross; Michael J. Hargrove; James M. Never; James A. Slinkman; Martin P. O'Boyle; Tom S. Scott; Joseph J. Delecki

Abstract Electrostatic discharge (ESD) performance of a shallow-trench-isolation double-diode protection circuit in CMOS technology is discussed. This paper highlights the sensitivities of these devices to semiconductor process parameters, interaction with chip circuitry and advanced failure analysis techniques.


Archive | 2000

Method for self-aligned vertical double-gate MOSFET

Scott W. Crowder; Michael J. Hargrove; Suk Hoon Ku; L. Ronald Logan


Archive | 2001

Method of forming a body contact using BOX modification

Kenneth J. Giewont; Eric Adler; Neena Garg; Michael J. Hargrove; Charles W. Koburger; Junedong Lee; Dominic J. Schepis; Isabel Y. Yang


Archive | 1999

SOI CMOS body contact through gate, self-aligned to source- drain diffusions

Michael J. Hargrove; Jack A. Mandelman


Archive | 1999

Method for fabricating different gate oxide thicknesses within the same chip

Scott W. Crowder; Anthony G. Domenicucci; Liang-Kai Han; Michael J. Hargrove; Paul Ronsheim


Archive | 1999

Dual buried oxide film SOI structure and method of manufacturing the same

Michael J. Hargrove; Steven H. Voldman


Archive | 1995

Electrostatic discharge suppression circuit employing trench capacitor

Michael J. Hargrove; Steven H. Voldman


Archive | 2000

SOI CMOS dynamic circuits having threshold voltage control

Fariborz Assaderaghi; Kerry Bernstein; Michael J. Hargrove; Norman J. Rohrer; Peter Smeys


Archive | 2004

Method of controlling floating body effects in an asymmetrical SOI device

James W. Adkisson; Michael J. Hargrove; Lyndon R. Logan; Isabel Y. Yang


Archive | 2005

Shallow trench isolation structure for strained Si on SiGe

Steven J. Koester; Klaus Dietrich Beyer; Michael J. Hargrove; Kern Rim; Kevin K. Chan

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